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Carbosilanes are compounds in which the elements of silicon and carbon alternate in a molecular framework or polymeric backbone in an approximate ratio of 1:1. By appropriate selection of the carbosilane precursor and deposition conditions the silicon carbide framework can be shifted toward substituted silicon and diamond-like structures.
Methylsilane; 1MS; Silylmethane; Monomethylsilane; Monosilylmethane
CAUTION: CAN FORM EXPLOSIVE MIXTURES WITH AIR
EINECS Number: 213-598-5
Alternative Name: 1MS
Specific Gravity: 0.628
HMIS Key: 3-4-3-X
Hydrolytic Sensitivity: 9: reacts extremely rapidly with atmospheric moisture - may be pyrophoric - glove box or sealed system required
Application: Plasma polymerization yields dry process photoresist.1
Intermediate for poly(methylsilane) precursor to silicon carbide.2
Deposits SiC on Si and Ge at 400 - 500?C.3
Source for hydrogenated amorphous silicon carbide films.4
Reference: 1. Dabbagh, G. et al. J. Photopolym. Sci. Tech. 1998, 11, 651.
2. Fhang, Z. et al. J. Am. Ceram. Soc. 1991, 74, 670.
3. Takatsuka, T. et al. Appl. Surf. Sci. 2000, 162, 156.
4. Lee, M. et al. in “Chemical Aspects of Electronic Ceramics Processing” Arkles, B. ed., MRS Proc. 1998, 495, 153.
Additional Properties: 130Dipole moment: 0.73 debye?Hcomb: -624 kcal/mole79.3°?Hform: -7 kcal/mole?Hvap: 4.6 kcal/moleVapor pressure, 21°: 14 atm (210 psia)