TETRACHLOROSILANE, 98%

Product Code: SIT7085.0
CAS No: 10026-04-7
SDS Sheets: EU | US
COMMERCIAL
10026-04-7
Pack Size
Quantity
Price
 
25 g
$32.00
2.5 kg
$207.50
25 kg
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250 kg
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600 kg
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Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    233-054-0
  • Synonyms

    SILICON TETRACHLORIDE
  • HMIS

    3-0-2-X
  • Molecular Formula

    Cl4Sn
  • Molecular Weight (g/mol)

    169.90
  • Purity (%)

    98%
  • TSCA

    Yes
  • Delta H Vaporization (kJ/mol)

    7.6 kcal/mole
  • Boiling Point (˚C/mmHg)

    57.6
  • Density (g/mL)

    1.481
  • Melting Point (˚C)

    -70°
  • Refractive Index @ 20˚C

    1.4153
  • Viscosity at 25 ˚C (cSt)

    0.35

Additional Properties

  • Hydrolytic Sensitivity

    8: reacts rapidly with moisture, water, protic solvents
  • Surface Tension (mN/m)

    19.7
  • Application

    Enantioselectively opens stilbine epoxides to trichlorosilylated chlorohydrins.1
    Promotes the reaction of aldehydes with isocyanides.2

    Reference

    1. Tao, B. et al. J. Am. Chem. Soc. 2001, 123, 353.
    2. Denmark, S. E.; Fan, Y. J. Am. Chem. Soc. 2003, 125, 7825.

    Safety

  • Hazard Info

    ihl rat, LD50: 8,000 ppm/4H
  • Packaging Under

    Nitrogen
  • ALD Material

    Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

    Tetrachlorosilane; Silicon chloride; Silicon tetrachloride

  • Viscosity: 0.35 cSt
  • ΔHform: -640 kJ/mol
  • ΔHvap: 31.8 kJ/mol
  • ΔHfus: 45.2 J/g
  • Surface tension: 19.7 mN/m
  • Dielectric constant: 2.40
  • Vapor pressure, 20 °C: 194 mm
  • Critical pressure: 37.0 atm
  • Critical temperature: 234 °C
  • Coefficient of thermal expansion: 1.1 x 10-3
  • Specific heat: 0.84 J/g/°
  • Reaction with living alkali metal terminated polymers results in star polymers
  • Primary industrial use - combustion with hydrogen and air to give fumed silica
  • Enantioselectively opens stilbine epoxides to trichlorosilylated chlorohydrins
  • Promotes the reaction of aldehydes with isocyanides