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EINECS Number: 231-961-6
Specific Gravity: 1.53
HMIS Key: 4-4-3-X
Hydrolytic Sensitivity: 10: reacts extremely rapidly with moisture and oxygen - may be pyrophoric - sealed system required
Application: Employed in epitaxial chemical vapor deposition of germanium thin films for solar devices and LEDs.1,2
Reference: 1. DeBoer, W. et al. Appl. Phys. Lett. 1991, 58, 1286.
2. Kühne, H. et al. J. Mater. Res. 1993, 8, 131.
Additional Properties: 308°K?Hform: 21.6 kcal/mole54.8 atm?Hvap: 3.36 kcal/mole