OCTAMETHYLCYCLOTETRASILOXANE, 98%

Product Code: SIO6700.0
CAS No: 556-67-2
SDS Sheets: EU | US
COMMERCIAL
556-67-2
Pack Size
Quantity
Price
 
100 g
$18.00
2 kg
$104.00
15 kg
$450.00
195 kg
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Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    209-136-7
  • Synonyms

    D4
  • HMIS

    1-2-0-X
  • Molecular Formula

    C8H24O4Si4
  • Molecular Weight (g/mol)

    296.61
  • Purity (%)

    98%
  • TSCA

    Yes
  • Delta H Vaporization (kJ/mol)

    10.9 kcal/mole
  • Autoignition Temp (˚C)

    400
  • Boiling Point (˚C/mmHg)

    175-176
  • Coefficient of Thermal Expansion (x10-4 K-1)

    0.8 x10-3
  • Density (g/mL)

    0.956
  • Dielectric Constant (F/m)

    2.39
  • Flash Point (˚C)

    51 °C
  • Melting Point (˚C)

    17.4°
  • Refractive Index @ 20˚C

    1.3968
  • Viscosity at 25 ˚C (cSt)

    '2.3

Additional Properties

  • Hydrolytic Sensitivity

    1: no significant reaction with aqueous systems
  • Surface Tension (mN/m)

    17.9
  • Safety

  • Packaging Under

    Nitrogen
  • ALD Material

    Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

    Octamethylcyclotetrasiloxane; D4; Cyclic tetramer; Cyclomethicone; Cyclohexasiloxane; Cyclotetrasiloxane; OMCTS

  • Viscosity: 2.3 cSt
  • ΔHfus: 18.4 kJ/mol
  • ΔHvap: 45.6 kJ/mol
  • Dipole moment: 1.09 debye
  • Vapor pressure, 23 °C: 1 mm
  • Dielectric constant: 2.39
  • Ring strain: 1.00 kJ/mol
  • Surface tension, 20 °C: 17.9 mN/m
  • Critical temperature: 314 °C
  • Critical pressure: 1.03 mPa
  • Specific heat: 502 J/g/°
  • Coefficient of thermal expansion: 0.8 x 10-3
  • Cryoscopic constant: 11.2
  • Henry’s law constant, Hc: 3.4 ± 1.7
  • Ea, polym: 79 kJ/mol
  • Octanol/water partition coefficient, log Kow: 5.1
  • Basic building block for silicones by ring-opening polymerization
  • Solubility, water: 50 ?g/l