3-AMINOPROPYLMETHYLDIETHOXYSILANE

Product Code: SIA0605.0
CAS No: 3179-76-8
SDS Sheets: EU | US
COMMERCIAL
3179-76-8
Pack Size
Quantity
Price
 
25 g
$15.00
2 kg
$202.00
15 kg
$945.00
180 kg
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Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    221-660-8
  • Synonyms

    3-AMINOPROPYLMETHYLDIETHOXYSILANE
  • HMIS

    3-2-1-X
  • Molecular Formula

    C8H21NO2Si
  • Molecular Weight (g/mol)

    191.34
  • Purity (%)

    95%
  • TSCA

    Yes
  • Boiling Point (˚C/mmHg)

    85-8° / 8
  • Density (g/mL)

    0.916
  • Flash Point (˚C)

    85°C (185°F)
  • Refractive Index @ 20˚C

    1.4272

Additional Properties

  • Hydrolytic Sensitivity

    7: reacts slowly with moisture/water
  • Application

    Vapor phase deposition >150? on silica yields high density amine functionality.1

    Reference

    1. Ek, S. et al. Langmuir 2003, 19, 3461.

    Safety

  • Hazard Info

    oral rat, LD50: 4,760 mg/kg
  • Packaging Under

    Nitrogen
  • Monoamino Functional Dialkoxy Silane

    Silane coupling agents have the ability to form a durable bond between organic and inorganic materials to generate desired heterogeneous environments or to incorporate the bulk properties of different phases into a uniform composite structure. The general formula has two classes of functionality. The hydrolyzable group forms stable condensation products with siliceous surfaces and other oxides such as those of aluminum, zirconium, tin, titanium, and nickel. The organofunctional group alters the wetting or adhesion characteristics of the substrate, utilizes the substrate to catalyze chemical transformations at the heterogeneous interface, orders the interfacial region, or modifies its partition characteristics, and significantly effects the covalent bond between organic and inorganic materials.

    3-Aminopropylmethyldiethoxysilane, 3-(diethoxymethylsilyl)propylamine

  • Primary amine coupling agent for UV cure and epoxy systems
  • Used in microparticle surface modification
  • Used in foundry resins: phenolic novolaks and resols
  • Vapor phase deposition >150 °C on silica yields high density amine functionality