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- HMIS 2-4-2-X
- Molecular Formula C5H12Si
- Molecular Weight (g/mol) 100.24
- Purity (%) tech
- TSCA Yes
- Boiling Point (˚C/mmHg) 69-70°
- Density (g/mL) 0.705
- Density Temperature (˚C) 25
- Flash Point (˚C) -20 °C
- Refractive Index @ 20˚C 1.4029
Dry-development resist produced by plasma polymerization.1
1. Fujitsu, Chem. Abstr.101, 31148n; Jap. Patent 59013323, 1984.