3275-24-9

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TITANIUM TETRAKIS(DIMETHYLAMIDE), 99+%

Product Code: OMTI080

Cas No: 3275-24-9

R&D quantities:

25 g
$396.00
5 g
$99.00
ALD Material

Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

Titanium tetrakis(dimethylamide); TDMAT; Tetrakis(dimethylamido)titanium; Tetrakisdimethylaminotitanium
  • Catalyzes the preparation of N-heterocycles via C-N bond formation
  • Boiling Point: 50° / 0.05

    EINECS Number: 221-904-3

    Molecular Weight: 224.20

    Alternative Name: TDMAT

    Specific Gravity: 0.947

    Flashpoint: 87°C (189°F)

    HMIS Key: 4-3-1-X

    Hydrolytic Sensitivity: 8: reacts rapidly with moisture, water, protic solvents

    TSCA: TSCA

    Application: Catalyzes the preparation of N-heterocycles via C-N bond formation.1

    Reference: 1. Shen, H.; Xie, Z. J. Am. Chem. Soc. 2010, 132, 11473.