TITANIUM ISOPROPOXIDE

Product Code: AKT872
CAS No: 546-68-9
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546-68-9
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100 g
$21.00
2 kg
$114.00
17 kg
$561.00
190 kg
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Prices listed are EXW price (Morrisville, PA US) in USD. Prices vary depending on currency and Incoterms.

Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    208-909-6
  • HMIS

    2-3-1-X
  • Molecular Formula

    C12H28O4Ti
  • Molecular Weight (g/mol)

    284.25
  • TSCA

    Yes
  • Delta H Vaporization (kJ/mol)

    14.7 kcal/mole
  • Boiling Point (˚C/mmHg)

    58/1
  • Density (g/mL)

    0.937
  • Flash Point (˚C)

    25 °C
  • Melting Point (˚C)

    15-19°
  • Refractive Index @ 20˚C

    1.4654
  • Viscosity at 25 ˚C (cSt)

    2

Additional Properties

  • Hydrolytic Sensitivity

    7: reacts slowly with moisture/water

    • Application

    Vapor phase pyrolysis gives oxide.1
    Yields coatings of barium titanate in combination with Ba(OR)2.2
    Utilized in spray pyrolysis synthesis of BaTiO3 and SrTiO3.3
    Catalyst for rearrangement4 and cleavage5 of epoxy alcohols.
    Catalyst for cyclization of ?-amino acids to lactams.6
    In combination with lead alkyls yields PZT films by MOCVD.7
    Review of reactions in combination with Grignard reagents and various organic substrates.8
    In combination with triethylamine and trimethylchlorosilane extends aldehydes to two carbons to enals.9

    Fieser

    F&F: Vol. 6, p. 11; Vol. 10, p. 404; Vol. 11, p. 3724 Vol. 12, p. 19, 504; Vol. 13, p. 13; Vol. 14, p. 247, 311; Vol. 16, p. 339; Vol. 17, p. 347.

    Reference

    1. Nandi, M. et al. Inorg. Chem. 1990, 29, 3065.
    2. Scuhoff, L. U.S. Patent 3,002,861, 1961.
    3. Nonaka, S. et al. J. Mater. Res. 1991, 6, 1750.
    4. Morgans, D. et al. J. Am. Chem. Soc. 1981, 103, 462.
    5. Caron, M. et al. J. Org. Chem. 1985, 50, 1557.
    6. Mader, M. et al. Tetrahedron Lett. 1988, 29, 3049.
    7. Kwak, B. S. et al. Appl. Phys. Lett. 1988, 53, 1702.
    8. Wolan, A.; Six, Y. Tetrahedron 2010, 66, 15.
    9. Kagana, N. et al. Tetrahedron Lett. 2010, 51, 482.

    Safety

  • Hazard Info

    ihl rat,4 hour LD50: 7.78 mg/l
  • Packaging Under

    Nitrogen

    • ALD Material

    Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

    Titanium isopropoxide; Isopropyltitanate; Titanium tetra(2-propoxide); Tetraisopropyl titanate

  • Viscosity: 2 cSt
  • ΔHform: -377 kcal/mol
  • ΔHvap: 14.7 kcal/mol
  • Metal content: 16.6-16.9% Ti
  • Vapor pressure, 50 °C: 0.9 mm
  • Vapor pressure, 100 °C: 19 mm
  • Soluble: heptane, isopropanol
  • Molecular complexity: 1.4
  • Vapor phase pyrolysis gives oxide
  • Yields coatings of barium titanate in combination with Ba(OR)2
  • Utilized in spray pyrolysis synthesis of BaTiO3 and SrTiO3
  • Catalyst for rearrangement and cleavage of epoxy alcohols
  • Catalyst for cyclization of ω-amino acids to lactams
  • In combination with lead alkyls yields lead zirconate titanate (PZT) films by Metal-Organic Chemical Vapour Deposition (MOCVD)
  • In combination with triethylamine and trimethylchlorosilane extends aldehydes to two carbons to enals
  • Provides scratch-resistance for glass bottles by pyrolytic coating at 500 °C