NICKEL(II) 2,4-PENTANEDIONATE

Product Code: AKN580
CAS No: 3264-82-2
SDS Sheets: EU | US
COMMERCIAL
3264-82-2
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25 g
$38.00
100 g
$121.00
10 kg
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Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    221-875-7
  • HMIS

    3-1-0-X
  • Molecular Formula

    C10H14NiO4
  • Molecular Weight (g/mol)

    256.91
  • TSCA

    Yes
  • Boiling Point (˚C/mmHg)

    NA
  • Density (g/mL)

    1.455
  • Melting Point (˚C)

    208° dec
  • Refractive Index @ 20˚C

    1.57-1.64

Additional Properties

  • Hydrolytic Sensitivity

    0: forms stable aqueous solutions
  • Application

    Catalyzes conjugate addition of alkynyl aluminums to enones.1
    Catalyzes coupling of Grignard reagents to give biaryls.2
    Catalyzes Grignard additions to silyl enol ethers forming alkenes.3
    Thermochromic effect in non-coordinating solvents at 200°C.4
    UV stabilizer for polyphenylene sulfide.5
    Catalyzes coupling of dialkylzincs with alkyl iodides.6
    Intermediate for Ni nanoparticles by reduction with NaBH4.7
    Forms Ni3C nanocrystals by thermolysis in oleylamine.8

    Reference

    1. Hansen, R. T. et al. J. Am. Chem. Soc. 1978, 100, 2244.
    2. Clough, R. L. J. Org. Chem. 1976, 41, 2252.
    3. Hayashi, T. et al. Tetrahedron Lett. 1980, 3915.
    4. Cotton, F. et al. J. Am. Chem. Soc. 1961, 83, 2818.
    5. Stahlke, K. Chem. Abstr. 114, 144761u; Eur. Patent Application 326,888, 1989.
    6. Giovannini, G. R. et al. J. Org. Chem. 1999, 64, 3544.
    7. Green, M. et al. J. Chem. Soc., Chem. Commun. 2001, 1912.
    8. Goto, Y. et al. Chem. Mater. 2008, 20, 4156.

    Safety

  • Hazard Info

    ipr mus, LD50: 125 mg/kg
  • Packaging Under

    Nitrogen
  • ALD Material

    Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

    Nickel(II) 2,4-pentanedionate; Acetylacetonate: nickel acac; Bis(pentane-2,4-dionato-O,O')nickel; Nickel(II)bis(4-hydroxy-2-pentanolate)

  • Metal content: 22.5-23.6% Ni
  • ΔHsub: 16.5 kcal/mol
  • Vapor pressure, 145 °C: 0.01 mm
  • Color: green - turns turquoise on absorption of 3 mol H2O
  • Solubility, ethanol: 27 g/L
  • Solubility, methoxyethoxyethanol: 70 g/L
  • Solubility, toluene: 85 g/L
  • Solubility, water: 11.0 g/L
  • UV max: 265-298 nm
  • Trimeric compound
  • Water removed by azeotropic distillation with toluene
  • NMR shift reagent
  • Catalyzes conjugate addition of alkynyl aluminums to enones
  • Catalyzes coupling of Grignard reagents to give biaryls
  • Catalyzes Grignard additions to silyl enol ethers forming alkenes
  • Thermochromic effect in non-coordinating solvents at 200 °C
  • UV stabilizer for polyphenylene sulfide
  • Catalyzes coupling of dialkylzincs with alkyl iodides
  • Intermediate for Ni nanoparticles by reduction of NaBH4
  • Forms Ni3C nanocrystalas by thermolysis in oleylamine