“Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications,” ECS Journal of Solid State Science and Technology 9, 063006 (2020).

“The Low-Temperature Remote-Plasma-Activated Pulsed CVD Route to SiNx from 1,3,5-tri(isopropyl)cyclotrisilazane,” Thin Solid Films 711, 138299 (2020).

“Near-Room-Temperature Soft Plasma Pulsed Deposition of SiCxNy from 1,3,5-tri(isopropyl)cyclotrisilazane,” ECS Transactions 98(3).