Additional Properties
- HMIS 2-2-0-X
- Molecular Formula C12H36Si5
- Molecular Weight (g/mol) 320.85
- Purity (%) 97%
- Boiling Point (˚C/mmHg) NA
- Melting Point (˚C) 267° sub.; 319-21° (sealed tube)
Application
Mediates photochemical alkylation of heteroaromatic bases with alkyl halides.1
Precursor for CVD of amorphous hydrogenated silicon - carbon films.2
Reference
1. Togo, H. et al. Chem. Lett. 1991, 11, 2063.
2. Wrobel, A. et al. Chem. Mater. 1995, 7, 1403.
Safety
Tetrakis(trimethylsilyl)silane
Silicon Chemistry, Applied Technology