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TRISILANE
Boiling Point: 52.9°
Melting Point: -117°
Molecular Weight: 92.32
Specific Gravity: 0.7430
HMIS Key: 3-4-3-X
Hydrolytic Sensitivity: 10: reacts extremely rapidly with moisture and oxygen - may be pyrophoric - sealed system required
Formula: H8Si3
Refractive Index: 1.4978
TSCA: TSCA-L
Application: Employed in low-temperature CVD of silicon and silicon alloys.1,2
Forms silicon nanowires initiated by gold seeds.3
Reference: 1. Akhtar, M. et al. MRS Proc. 1986, 70.
2. Todd, M. et al. U.S. Patent 6,821,825, 2004.
3. Heitsch, A. et al. J. Am. Chem. Soc. 2008, 130, 5436.
Additional Properties: ?Hform: 121 kJ/mole?Hvap: 6.666 kcal/moleBond dissociation energy (Si-Si): 313 kJ/moleVapor pressure, 0°: 95.5 mm