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Product Code: OMHF083

Cas No: 352535-01-4

Pack Size


5 g
25 g
ALD Material

Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

Hafnium tetrakis(ethylmethylamide); Tetrakis(ethylmethylamido)hafnium
  • ALD process window: 150-225 °C
  • High purity grade available, OMHF083.1
  • Boiling Point: 78° / 0.01

    Melting Point: > 300

    Molecular Weight: 410.90

    Specific Gravity: 1.324

    Flashpoint: 10°C (50°F)

    HMIS Key: 3-3-1-X

    Hydrolytic Sensitivity: TSCA

    Formula: C12H32HfN4


    Additional Properties: ALD process window: 150-225°C