n-BUTYLTRICHLOROTIN

Product Code: SNB2000
CAS No: 1118-46-3
SDS Sheets: EU | US
Pack Size
Quantity
Price
 
25 g
$22.00
250 g
$146.00
5 kg
$750.00
20 kg
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Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    214-263-6
  • HMIS

    3-1-1-X
  • Molecular Formula

    C4H9Cl3Sn
  • Molecular Weight (g/mol)

    282.17
  • TSCA

    Yes
  • Boiling Point (˚C/mmHg)

    93° / 10
  • Density (g/mL)

    1.693
  • Melting Point (˚C)

    -63°
  • Refractive Index @ 20˚C

    1.5229

Additional Properties

  • Hydrolytic Sensitivity

    7: reacts slowly with moisture/water
  • Application

    In combination with fluorides produces doped films of tin oxide on glass at 650° used for low-emissivity windows.1
    Catalyst for epoxidation and polymerization reactions.2

    Reference

    1. Gitlitz, M. et al. CHEMTECH 1992, 22, 552.
    2. F&F: Vol. 15, p 65.

    Safety

  • Hazard Info

    oral rat, LD50: 2,140 mg/kg
  • Packaging Under

    Nitrogen
  • ALD Material

    Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

    n-Butyltrichlorotin ; Butyltintrichloride; n-Butyltrichlorostannane; Monobutyltin trichloride; Butyltrichlorostannane

  • Dipole moment: 4.28 debye
  • Produces doped films of tin oxide on glass at 650 °C in combination with fluorides
  • Used for low-emissivity windows
  • Catalyst for epoxidation and polymerization reactions