TRIETHYLIODOSILANE

Product Code: SIT8290.0
CAS No: 1112-49-8
SDS Sheets: EU | US
Pack Size
Quantity
Price
 
5 g
$76.00

Product data and descriptions listed are typical values, not intended to be used as specification.

  • HMIS

    3-2-1-X
  • Molecular Formula

    C6H15ISi
  • Molecular Weight (g/mol)

    242.18
  • Boiling Point (˚C/mmHg)

    40-5° / 2

Additional Properties

  • Hydrolytic Sensitivity

    7: reacts slowly with moisture/water
  • Safety

  • Packaging Under

    Nitrogen
  • Silicon Chemistry, Applied Technology

    Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: Trends in Deposition Techniques and Related Applications – Kaloyeros, Jove, Goff, & Arkles

    This article provides an overview of the state-of-the-art chemistry and processing technologies for silicon nitride and silicon nitride- rich films, i.e., silicon nitride with C inclusion, both in hydrogenated (SiNx:H and SiNx:H(C)) and non-hydrogenated (SiNx and SiNx(C)) forms. The emphasis is on emerging trends and innovations in these SiNx material system technologies, with focus on Si and N source chemistries and thin film growth processes, including their primary effects on resulting film properties. It also illustrates that SiNx and its SiNx(C) derivative are the focus of an ever-growing research and manufacturing interest and that their potential usages are expanding into new technological areas.