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Product data and descriptions listed are typical values, not intended to be used as specification.
HMIS Key: 2-2-1-X
Hydrolytic Sensitivity: 3: reacts with aqueous base
Application: Forms radical cation on radiolysis.1
Supersilyl starting material; forms a variety of sterically overloaded compounds.2
Reference: 1. Rhodes, C. J. Organomet. Chem. 1993, 443, 19.
2. Wiberg, N. in Frontiers of Organosilicon Chem.; Bassindale, A., Ed.; Royal Society Chemistry: 1991; p. 263.