To search by structure, left click in the box below to display the chemdraw toolbar. Then, draw the chemical structure of interest in the box using the toolbar. When your structure is complete, click “Search by Name” or “Search by SMILES” to generate the product name or SMILES respectively. This feature will search within the Gelest product database for matching chemical names or SMILES. Note: In cases where Gelest uses alternate chemical names, it may be necessary to search for the product of interest by its CAS#.
All structures are computer generated. Please rely on the product data below for placing your order. If you see any errors in structures, please email customer service so that they can be addressed.
SILICON DIOXIDE, amorphous, HEXAMETHYLDISILAZANE TREATED
Organosilane-modified silica nanoparticles
A range of silica structures from 20 nm to 1 micron have been modified with silanes to reduce hydroxyl content allowing improved dispersion. Other versions have monolayers with isolated secondary amine functionality, providing controlled interactions with resins. Systems that maintain low levels of hydroxyls have improved electrical properties. Introduction of low levels of secondary amines impart improved mechanical properties particularly in high humidity environments.
EINECS Number: 272-697-1
Melting Point: >1,600°
Molecular Weight: 60.09
Alternative Name: Fumed silica, HMDZ treated
Specific Gravity: 2.2
HMIS Key: 2-0-0-X
Hydrolytic Sensitivity: 5: forms reversible hydrate
Refractive Index: 1.45
Additional Properties: Carbon content: 3%Calculated ratio: (CH3)3Si/HO-Si: 2/1Surface area: 150-200 m2/g