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Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.
Trioctylphosphine; TOP; Trioctyltri-n-octylphosphine
Boiling Point: 175° / 0.3
EINECS Number: 225-234-2
Molecular Weight: 370.60
Specific Gravity: 0.831
Flashpoint: 147°C (297°F)
HMIS Key: 3-2-1-X
Hydrolytic Sensitivity: 8: reacts rapidly with moisture, water, protic solvents
Refractive Index: 1.468
Application: Reagent for SILAR deposition of CdSe-ZnSe core-shell quantum dots.1
Reference: 1. Hao, J. et al. J. Chem. Soc., Chem. Commun., 2013, 49, 6346.
Additional Properties: 168