TRIOCTYLPHOSPHINE, 95%

Product Code: OMPH080
CAS No: 4731-53-7
SDS Sheets: EU | US
Pack Size
Quantity
Price
 
25 g
$50.00

Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    225-234-2
  • Synonyms

    TRIOCTYLPHOSPHINE, 95%
  • HMIS

    3-2-1-X
  • Molecular Formula

    C24H51P
  • Molecular Weight (g/mol)

    370.60
  • Autoignition Temp (˚C)

    168
  • Boiling Point (˚C/mmHg)

    175° / 0.3
  • Density (g/mL)

    0.831
  • Flash Point (˚C)

    147°C (297°F)
  • Refractive Index @ 20˚C

    1.468

Additional Properties

  • Hydrolytic Sensitivity

    8: reacts rapidly with moisture, water, protic solvents
  • Application

    Reagent for SILAR deposition of CdSe-ZnSe core-shell quantum dots.1

    Reference

    1. Hao, J. et al. J. Chem. Soc., Chem. Commun., 2013, 49, 6346.

    Safety

  • Hazard Info

    oral rat, LD50: 5,600 mg/kg
  • Packaging Under

    Nitrogen
  • ALD Material

    Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

    Trioctylphosphine; TOP; Trioctyltri-n-octylphosphine

  • Reagent for SILAR deposition of CdSe-ZnSe core-shell quantum dots