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EINECS Number: 237-713-3
Melting Point: 150-1° dec
Molecular Weight: 264.01
Specific Gravity: 1.96
HMIS Key: 3-1-0-X
Hydrolytic Sensitivity: 4: no reaction with water under neutral conditions
Application: Forms X-ray mirrors by alternating deposition with SiO2 by PECVD.1
Reference: 1. Hamelmann, F. et al. Thin Solid Films 2000, 358, 90.
Fieser: F&F: Vol. 2, p 287; Vol. 3, p 206; Vol. 4, p 346; Vol. 9, p 317; Vol. 10, p 273; Vol. 11, p 350; Vol. 12, p 330; Vol. 13, p 194; Vol. 16, p. 226.
Additional Properties: ?Hcomb: 507 kcal/mole?Hform: 233 kcal/moleSolubility, ether: 16 g/lPrecursor for the deposition of molybdenum metal