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- HMIS 3-2-0-X
- Molecular Formula C20H16F12O8Zr
- Molecular Weight (g/mol) 703.54
- TSCA No
- Boiling Point (˚C/mmHg) NA
- Melting Point (˚C) 125-9°
Application
Employed in MOCVD of zirconia films.1
Reference
1. Desu, S. et al. In Chemical Vapor Deposition of Refractory Metals Besman, T. et al. Eds.; MRS Proc. 1990, 168, 349.
Safety
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