LITHIUM t-BUTOXIDE

Product Code: AKL454
CAS No: 1907-33-1
SDS Sheets: EU | US
Pack Size
Quantity
Price
 
25 g
$93.00
100 g
$301.00
2 kg
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10 kg
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Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    217-611-5
  • HMIS

    3-4-2-X
  • Molecular Formula

    C4H9LiO
  • Molecular Weight (g/mol)

    80.05
  • TSCA

    Yes
  • Boiling Point (˚C/mmHg)

    NA
  • Density (g/mL)

    0.89

Additional Properties

  • Hydrolytic Sensitivity

    7: reacts slowly with moisture/water
  • Application

    Sublimes as hexamer, hexamer in benzene.1

    Reference

    1. Bain, M. Can. J. Chem. 1964, 42, 945.

    Safety

  • Hazard Info

    oral mus, LD50: 1,682 mg/kg
  • Packaging Under

    Nitrogen
  • ALD Material

    Atomic layer deposition (ALD) is a chemically self-limiting deposition technique that is based on the sequential use of a gaseous chemical process. A thin film (as fine as -0.1 Å per cycle) results from repeating the deposition sequence as many times as needed to reach a certain thickness. The major characteristic of the films is the resulting conformality and the controlled deposition manner. Precursor selection is key in ALD processes, namely finding molecules which will have enough reactivity to produce the desired films yet are stable enough to be handled and safely delivered to the reaction chamber.

    Lithium t-butoxide; tert-Butoxylithium; Lithium tert-butylate; Lithium 2-methylpropan-2-olate; 2-Methyl-2-propanol, lithium salt

  • Solubility, tbutanol: 12 g/L
  • Solubility, heptane: 80 g/L
  • Solubility, THF: 196 g/L
  • Sublimes as hexamer, hexamer in benzene