COBALT(III) 2,4-PENTANEDIONATE

Product Code: AKC235
CAS No: 21679-46-9
SDS Sheets: EU | US
Pack Size
Quantity
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50 g
$69.00
250 g
$270.00
10 kg
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135 kg
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Product data and descriptions listed are typical values, not intended to be used as specification.

  • Einecs Number

    244-527-6
  • HMIS

    3-1-1-X
  • Molecular Formula

    C15H21CoO6
  • Molecular Weight (g/mol)

    356.24
  • TSCA

    Yes
  • Boiling Point (˚C/mmHg)

    340
  • Density (g/mL)

    1.418
  • Melting Point (˚C)

    214-6°

Application

Cocatalyst for the polymerization of dienes.1
Catalyst for the polymerization of propylene oxide.2
Photoinitiator.3
Component in preparation of light sensitive photographic materials.4

Reference

1. Blackley, D. et al. ACS Symp. Ser. 1976, 24, 162.
2. Hsieh, H. J. Appl. Polym. Sci. 1971, 15, 2425.
3. Kaeriyama, K. et al. Makromol. Chem. 1973, 167, 129.
4. Fuji Photo Chem. Abstr. 85, 54641h; U.S. Patent 3,933,488, 1976.

Safety

  • Hazard Info

    oral rat, LD50: 720 mg/kg
  • Packaging Under

    Nitrogen
  • Metal-Organic Chemistry

    Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications

    Cobalt metallic films are the subject of an ever-expanding academic and industrial interest for incorporation into a multitude of new technological applications. This report reviews the state-of-the art chemistry and deposition techniques for cobalt thin films, highlighting innovations in cobalt metal-organic chemical vapor deposition (MOCVD), plasma and thermal atomic layer deposition (ALD), as well as pulsed MOCVD technologies, and focusing on cobalt source precursors, thin and ultrathin film growth processes, and the resulting effects on film composition, resistivity and other pertinent properties.