Gelest
Silicon, Germanium, Tin and Metal-Organic Compounds




Self Assembled Monolayers
A Self-Assembled Monolayer (SAM) is a one molecule thick layer of material that bonds to a surface in an ordered way as a result of physical or chemical forces during a deposition process. Silanes can form SAMs by solution or vapor phase deposition processes. Most commonly, chlorosilanes or alkoxysilanes are used and once deposition occurs a chemical (oxane) bond forms with the surface rendering a permanent modification of the substrate. Applications for SAMs include micro-contact printing, soft lithography, dip-pen nanolithography, anti-stiction coatings and orientation layers involved in nanofabrication of MEMs, fluidic microassemblies, semiconductor sensors and memory devices.

Common long chain alkyl silanes used in the formation of SAMs are simple hydrocarbon, fluoroalkyl and end-group substituted silanes. Silanes with one hydrolysable group maintain interphase structure after deposition by forming a single oxane bond with the substrate. Silanes with three hydrolysable groups form siloxane (silsesquioxane) polymers after deposition, bonding both with each other as well as the substrate.

The most widely used silanes for formation of SAMs are listed below:

Alkyl-Silanes

SID4630.0Dodecyltrichlorosilane
SIO6640.0Octadecyltrichlorosilane (OTS)
SIO6640.1Octadecyltrichlorosilane (OTS)- high purity
SIO6645.0Octadecyltrimethoxysilane
SIO6615.0Octadecyldimethylchlorosilane
SIT8162.013-(Trichlorosilylmethyl)heptacosane


Fluoroalkyl-Silanes

SIT8174.0Tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane
SIH5841.0Heptadecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane


End-Group Modified Long Chain Alkyl-Silanes

SIB1908.011-Bromoundecyltrichlorosilane
SIC2456.011-Cyanoundecyltrimethoxysilane
SID4618.0Docosenyltriethoxysilane
SIM6491.5Methoxyethoxyundecyltrichlorosilane


For a listing of some other Gelest products, with references, which are useful in this application, click here.

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